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Cited 20 time in webofscience Cited 18 time in scopus
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Contact resistance change memory using N-doped Cr2Ge2Te6 phase-change material showing non-bulk resistance change

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dc.contributor.authorShuang, Y.-
dc.contributor.authorSutou, Y.-
dc.contributor.authorHatayama, S.-
dc.contributor.authorShindo, S.-
dc.contributor.authorSong, Yun Heub-
dc.contributor.authorAndo, D.-
dc.contributor.authorKoike, J.-
dc.date.accessioned2021-07-30T05:31:43Z-
dc.date.available2021-07-30T05:31:43Z-
dc.date.created2021-05-12-
dc.date.issued2018-04-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/5311-
dc.description.abstractPhase-change random access memory (PCRAM) is enabled by a large resistance contrast between amorphous and crystalline phases upon reversible switching between the two states. Thus, great efforts have been devoted to identifying potential phase-change materials (PCMs) with large electrical contrast to realize a more accurate reading operation. In contrast, although the truly dominant resistance in a scaled PCRAM cell is contact resistance, less attention has been paid toward the investigation of the contact property between PCMs and electrode metals. This study aims to propose a non-bulk-resistance-dominant PCRAM whose resistance is modulated only by contact. The contact-resistance-dominated PCM exploited here is N-doped Cr2Ge2Te6 (NCrGT), which exhibits almost no electrical resistivity difference between the two phases but exhibits a typical switching behavior involving a three-order-of-magnitude SET/RESET resistance ratio owing to its large contact resistance contrast. The conduction mechanism was discussed on the basis of current-voltage characteristics of the interface between the NCrGT and the W electrode.-
dc.language영어-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.titleContact resistance change memory using N-doped Cr2Ge2Te6 phase-change material showing non-bulk resistance change-
dc.typeArticle-
dc.contributor.affiliatedAuthorSong, Yun Heub-
dc.identifier.doi10.1063/1.5029327-
dc.identifier.scopusid2-s2.0-85046640457-
dc.identifier.wosid000431452900047-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.112, no.18-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume112-
dc.citation.number18-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics-
dc.relation.journalWebOfScienceCategoryApplied-
dc.subject.keywordPlusGE2SB2TE5 FILMS-
dc.subject.keywordPlusDATA-STORAGE-
dc.identifier.urlhttps://pubs.aip.org/aip/apl/article/112/18/183504/35255/Contact-resistance-change-memory-using-N-doped-
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