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Deposition of ruthenium thin film by plasma enhanced and thermal ALD processes for improving step coverage
- Authors
- 전형탁
- Issue Date
- 27-Jun-2011
- Place
- Royal Sonesta Hotel Boston
- Conference Name
- ALD 2011
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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