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Active control of D/H ratio in a-C/B:H(D) thin film deposition using D2 glow discharge for KSTAR

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dc.contributor.author정규선-
dc.date.accessioned2021-08-03T17:53:10Z-
dc.date.available2021-08-03T17:53:10Z-
dc.date.created2021-06-30-
dc.date.issued2011-02-23-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/56081-
dc.publisher국가핵융합연구소-
dc.titleActive control of D/H ratio in a-C/B:H(D) thin film deposition using D2 glow discharge for KSTAR-
dc.typeConference-
dc.contributor.affiliatedAuthor정규선-
dc.identifier.bibliographicCitation2011 KSTAR Conference and KO-US Workshop-
dc.relation.isPartOf2011 KSTAR Conference and KO-US Workshop-
dc.citation.title2011 KSTAR Conference and KO-US Workshop-
dc.citation.conferencePlace대한민국-
dc.type.rimsCONF-
dc.description.journalClass2-
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서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers

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