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Dependences of Electrical Properties on the Shape of the Recess Field in the Nanoscale Tantalum Nitride-Aluminium Oxide-Silicon nitride-Silicon Oxide-Silicon Memory Devices

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dc.contributor.author김태환-
dc.date.accessioned2021-08-03T18:33:52Z-
dc.date.available2021-08-03T18:33:52Z-
dc.date.created2021-06-30-
dc.date.issued2010-11-08-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/56775-
dc.publisherGwanju-Jeonnam Nano Technlolgy Union-
dc.titleDependences of Electrical Properties on the Shape of the Recess Field in the Nanoscale Tantalum Nitride-Aluminium Oxide-Silicon nitride-Silicon Oxide-Silicon Memory Devices-
dc.typeConference-
dc.contributor.affiliatedAuthor김태환-
dc.identifier.bibliographicCitationInternational Conference On Nano Science and Nano Technology (ICNST2010)-
dc.relation.isPartOfInternational Conference On Nano Science and Nano Technology (ICNST2010)-
dc.citation.titleInternational Conference On Nano Science and Nano Technology (ICNST2010)-
dc.citation.conferencePlaceOryonghall, Gwangu Institute of Science And Technology(GIST), Gwangu ,Korea-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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