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Template-directed Formation of Wall-thicknedd controlled Cu/Al2O3 nanocables Using Atomic Layer Deposition and Electrodeposition

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dc.contributor.author성명모-
dc.date.accessioned2021-08-03T19:20:23Z-
dc.date.available2021-08-03T19:20:23Z-
dc.date.created2021-06-30-
dc.date.issued2010-08-24-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/57904-
dc.publisherThe Materials Research Society of Korea-
dc.titleTemplate-directed Formation of Wall-thicknedd controlled Cu/Al2O3 nanocables Using Atomic Layer Deposition and Electrodeposition-
dc.typeConference-
dc.contributor.affiliatedAuthor성명모-
dc.identifier.bibliographicCitationIUMRS-ICEM 2010-
dc.relation.isPartOfIUMRS-ICEM 2010-
dc.citation.titleIUMRS-ICEM 2010-
dc.citation.conferencePlaceKINTEX-
dc.type.rimsCONF-
dc.description.journalClass1-
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서울 자연과학대학 > 서울 화학과 > 2. Conference Papers

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