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Investigation of the effect of plasma treatments in various ambients on the electrical properties of MIS structure by RPALD

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-03T19:20:50Z-
dc.date.available2021-08-03T19:20:50Z-
dc.date.issued20100823-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/57944-
dc.titleInvestigation of the effect of plasma treatments in various ambients on the electrical properties of MIS structure by RPALD-
dc.typeConference-
dc.citation.conferenceNameIUMRS-ICEM 2010-
dc.citation.conferencePlaceKINTEX , GyeongGi-Do, Korea-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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