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Bottom gate effec for 3D stackable Polycrystalline silicon channel Charge Trap Flash Memory

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dc.contributor.author이승백-
dc.date.accessioned2021-08-03T19:22:38Z-
dc.date.available2021-08-03T19:22:38Z-
dc.date.issued2010-07-27-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/58102-
dc.titleBottom gate effec for 3D stackable Polycrystalline silicon channel Charge Trap Flash Memory-
dc.typeConference-
dc.citation.conferenceName30th International Conference on the Physics of Semiconductors(ICPS2010)-
dc.citation.conferencePlace서울-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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