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원자층 증착법을 이용하여 형성한 Al2O3 유전체를 이용한 Indium Gallium Zinc Oxide 박막 트랜지스터의 특성

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-03T20:37:46Z-
dc.date.available2021-08-03T20:37:46Z-
dc.date.issued20091112-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/60097-
dc.title원자층 증착법을 이용하여 형성한 Al2O3 유전체를 이용한 Indium Gallium Zinc Oxide 박막 트랜지스터의 특성-
dc.typeConference-
dc.citation.conferenceName2009년도 추계 학술대회-
dc.citation.conferencePlace서울산업대학교 서울테크노파크-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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