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Electrostatically Modified Ceria Particles for Restraining of Remaining Particle and Scratch in STI CMP Process
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 백운규 | - |
| dc.date.accessioned | 2021-08-03T21:21:44Z | - |
| dc.date.available | 2021-08-03T21:21:44Z | - |
| dc.date.issued | 2009-09-07 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/61002 | - |
| dc.title | Electrostatically Modified Ceria Particles for Restraining of Remaining Particle and Scratch in STI CMP Process | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | ICCCI 2009 | - |
| dc.citation.conferencePlace | Kurashiki, Japan | - |
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Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
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Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)