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EUVL 포토마스크 오염제어 전략 및 수평유동에서의 오염평가 모델
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 육세진 | - |
| dc.date.accessioned | 2021-08-03T21:35:47Z | - |
| dc.date.available | 2021-08-03T21:35:47Z | - |
| dc.date.issued | 2009-06-23 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/61417 | - |
| dc.description.abstract | Gaussian Diffusion Sphere Model (GDSM) was developed to predict particulate contamination for an aerosol flow over a flat surface. Good agreement was found when the GDSM was compared with the well-known theories. GDSM can be extended to predict particulate contamination of EUVL masks in a parallel flow. Extending the GDSM to predict particulate contamination of a face-down wafer/mask is going on. | - |
| dc.title | EUVL 포토마스크 오염제어 전략 및 수평유동에서의 오염평가 모델 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제3회 반도체공정 진단 Workshop | - |
| dc.citation.conferencePlace | 한국표준과학연구원, 대전 | - |
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Collections - 서울 공과대학 > 서울 기계공학부 > 2. Conference Papers
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Related Researcher
- Yook, Se Jin
- COLLEGE OF ENGINEERING (SCHOOL OF MECHANICAL ENGINEERING)