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Protection schemes for EUVL photomasks
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 육세진 | - |
| dc.date.accessioned | 2021-08-03T22:20:46Z | - |
| dc.date.available | 2021-08-03T22:20:46Z | - |
| dc.date.issued | 2009-02-12 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/62407 | - |
| dc.description.abstract | Particle contamination control is important for EUVL masks, since pellicles cannot be used in EUVL. Reduction of particle generation and prevention of particle deposition are key factors to solve particle contamination problems for EUVL masks. | - |
| dc.title | Protection schemes for EUVL photomasks | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제3회 차세대 입자 및 에어로졸 연구회 워크샵 | - |
| dc.citation.conferencePlace | 한양대학교 | - |
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Collections - 서울 공과대학 > 서울 기계공학부 > 2. Conference Papers
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Related Researcher
- Yook, Se Jin
- COLLEGE OF ENGINEERING (SCHOOL OF MECHANICAL ENGINEERING)