Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effects of Nitrogen Profile on Characteristics of Remote Plasma Atomic Layer Deposited-Nitrided Hf Silicate Thin Films
- Authors
- 전형탁
- Issue Date
- 1-Jul-2008
- Place
- Brugge, Belgium
- Conference Name
- 8th International Conference on Atomic Layer Deposition- ALD 2008
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.