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Copper Atomic Layer Deposition by Using Substitution Reaction Between Cu(OCH(Me)CH2NMe2)2 and Et2Zn
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2021-08-03T23:53:25Z | - |
| dc.date.available | 2021-08-03T23:53:25Z | - |
| dc.date.issued | 2008-04-18 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/65103 | - |
| dc.title | Copper Atomic Layer Deposition by Using Substitution Reaction Between Cu(OCH(Me)CH2NMe2)2 and Et2Zn | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제 101회 대한화학회 | - |
| dc.citation.conferencePlace | 일산 킨텍스 | - |
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Collections - 서울 자연과학대학 > 서울 화학과 > 2. Conference Papers
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Related Researcher
- Sung, Myung Mo
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF CHEMISTRY)