Half-metallic ferromagnet formation on Si wafers by Silicidation Process

Abstract

Half-metallic ferromagnets are promising materials for spintronics due to their unique capability to produce 100% spin-larized current. In oredr to explore their utilization as self-aligned source/drain electrodes for the spin transistor processed on Si wafers, we investigated the formation Co2MnSi compunds by the silicidation process. In this presentation, our findings on compositional profiles of the resulting Co-Mn-Si layers with various processing parameters and their magnetic properties.