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Effects of N2 and N2O Post-Plasma Treatments on Hafnium Silicate Gate Dielectrics Grown by Remote Plasma Technique
- Authors
- 전형탁
- Issue Date
- 8-Oct-2007
- Place
- Hilton Washington, Washington, DC
- Conference Name
- 212th ESC meeting, October 7-12
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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