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Self-Assembled NiSi2 Nanocrystals For Nanoscale Non-Volatile Memory Application

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dc.contributor.author이승백-
dc.date.accessioned2021-08-04T01:24:18Z-
dc.date.available2021-08-04T01:24:18Z-
dc.date.issued2007-06-01-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/67369-
dc.description.abstractWe investigated the charge storage capability of self-assembled monolayers of NiSi2 nanocrystals embedded in SiO2 layers. The NiSi2 films with thickness of 3 and 5 nm were sputter deposited on oxidized Si substrates. By subjecting the sputtered NiSi2 thin-film to rapid thermal annealing a monolayer of NiSi2 nanocrystals was formed-
dc.titleSelf-Assembled NiSi2 Nanocrystals For Nanoscale Non-Volatile Memory Application-
dc.typeConference-
dc.citation.conferenceNameThe 51th international conference on electron, ion, and photon beam technology and nanofabrication-
dc.citation.conferencePlaceDenver, CO, USA-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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