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Surface Modification of MgO Thin Films with Self-assembled Alkylsiloxane Monolayers in Vacuum

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dc.contributor.author성명모-
dc.date.accessioned2021-08-04T01:36:07Z-
dc.date.available2021-08-04T01:36:07Z-
dc.date.issued2007-05-10-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/67622-
dc.description.abstractMgO thin films are usually used as a protective layer of dielectrics in the AC-plasma display panel (AC-PDP) to improve discharge characteristics and the panel`s life time, because of its physical stability, high transmittance and secondary electron emission coefficient. But MgO has serious problem in chemical stability: MgO physically and chemically absorbs moisture, forming Mg(OH)2 easily. The purpose of this study is molecular-level modification of MgO surfaces with alkylsilane-based self-assembled monolayers (SAMs) for protection of MgO against hydration. The SAMs adsorbed on the surface of MgO were characterized by x-ray photoelectron spectroscopy (XPS) and contact angle analyzer (CAA). The results of XPS and contact angle measurements showed that these films have sufficiently high protection ability against hydration, and the densely packed monolayers of alkaylsilanes can be applicable for protective films on the surface against hydration.-
dc.titleSurface Modification of MgO Thin Films with Self-assembled Alkylsiloxane Monolayers in Vacuum-
dc.typeConference-
dc.citation.conferenceNameThe 18th International conference on Molecular Electronics and Devices-
dc.citation.conferencePlace한국전자통신연구원-
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서울 자연과학대학 > 서울 화학과 > 2. Conference Papers

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