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차세대 플라즈마 원자층증착을 이용한 고품질 자기정렬다중패터닝 spacer 원천기술 개발

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dc.contributor.author전형탁-
dc.date.accessioned2021-07-30T08:25:38Z-
dc.date.available2021-07-30T08:25:38Z-
dc.date.issued2020-11-16-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/6812-
dc.title차세대 플라즈마 원자층증착을 이용한 고품질 자기정렬다중패터닝 spacer 원천기술 개발-
dc.typeConference-
dc.citation.conferenceName미래반도체소자 2020년 하반기 총괄워크숍-
dc.citation.conferencePlace서울 코엑스-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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