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Spark Plasma Sintering of ZnS-SiO2 for Sputtering Target
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김영도 | - |
| dc.date.accessioned | 2021-08-04T02:24:19Z | - |
| dc.date.available | 2021-08-04T02:24:19Z | - |
| dc.date.issued | 2006-10-30 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/68845 | - |
| dc.description.abstract | ZnS-SiO2 powder was prepared by two kinds of mixing method which were simple mixing by 3-D mixer and high energy ball-milling. These powders were densified by spark plasma sintering process. In case of the ball-milled ZnS-SiO2 powder, the SiO2 phase was more homogeneously distributed compared with that of simple mixed powder. Vickers hardness of sintered part was measured by Vickers indentation with a load of 9.8 N and duration time of 10 s. Fracture toughness was determined by the indentation fracture method using a Vickers indenter. In the ball-milled powder, fracture toughness was higher than that of simple mixed powder. | - |
| dc.title | Spark Plasma Sintering of ZnS-SiO2 for Sputtering Target | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | MAP 2006 (The 6th International Workshop on Microelectronics Assembling and Packaging) | - |
| dc.citation.conferencePlace | Fukuoka, Japan | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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