Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Barrier Characteristics of HfN Films Deposited by Using the Remote Plasma-Enhanced Atomic Layer Deposition Method
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-04T02:24:21Z | - |
| dc.date.available | 2021-08-04T02:24:21Z | - |
| dc.date.issued | 2006-10-30 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/68847 | - |
| dc.title | Barrier Characteristics of HfN Films Deposited by Using the Remote Plasma-Enhanced Atomic Layer Deposition Method | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 210th ECS MEETING | - |
| dc.citation.conferencePlace | cancun, Mexico | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.