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High-Resolution Patterning of Metal Thin Films with Water Mediated Transfer Process

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dc.contributor.author성명모-
dc.date.accessioned2021-08-04T02:30:37Z-
dc.date.available2021-08-04T02:30:37Z-
dc.date.issued2006-10-20-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/69061-
dc.description.abstractWe report a new nano-transfer printing (nTP) method that uses a water-mediated transfer process. Water-mediated nTP is based on the direct transfer of a metal thin film from a stamp to a substrate via a water-mediated surface bonding between the stamp and the substrate. This procedure can generate aluminum (Al) patterns with feature sizes as small as 60 nm. The transferred Al patterns chemically bound to the substrate surface and, thus, exhibited strong adhesion. The Al patterns were then used as hard masks for selective dry etching. The patterned Al thin films have been characterized by atomic force microscopy(AFM), scanning electron microscopy(SEM),-
dc.titleHigh-Resolution Patterning of Metal Thin Films with Water Mediated Transfer Process-
dc.typeConference-
dc.citation.conferenceName제 98회 대한화학회-
dc.citation.conferencePlace광주 김대중컨번션센터-
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서울 자연과학대학 > 서울 화학과 > 2. Conference Papers

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