Cited 0 time in
High-Resolution Patterning of Metal Thin Films with Water Mediated Transfer Process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2021-08-04T02:30:37Z | - |
| dc.date.available | 2021-08-04T02:30:37Z | - |
| dc.date.issued | 2006-10-20 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/69061 | - |
| dc.description.abstract | We report a new nano-transfer printing (nTP) method that uses a water-mediated transfer process. Water-mediated nTP is based on the direct transfer of a metal thin film from a stamp to a substrate via a water-mediated surface bonding between the stamp and the substrate. This procedure can generate aluminum (Al) patterns with feature sizes as small as 60 nm. The transferred Al patterns chemically bound to the substrate surface and, thus, exhibited strong adhesion. The Al patterns were then used as hard masks for selective dry etching. The patterned Al thin films have been characterized by atomic force microscopy(AFM), scanning electron microscopy(SEM), | - |
| dc.title | High-Resolution Patterning of Metal Thin Films with Water Mediated Transfer Process | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제 98회 대한화학회 | - |
| dc.citation.conferencePlace | 광주 김대중컨번션센터 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
