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Plasma effect of HfO2 Thin Film Deposited by O2 and O2+Ar Mixed lasma-Enhanced Atomic Layer Deposition (PEALD)
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-04T02:37:45Z | - |
| dc.date.available | 2021-08-04T02:37:45Z | - |
| dc.date.issued | 2006-09-13 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/69430 | - |
| dc.title | Plasma effect of HfO2 Thin Film Deposited by O2 and O2+Ar Mixed lasma-Enhanced Atomic Layer Deposition (PEALD) | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | IUMRS International Conference in Asia 2006 (IUMRS-ICA-2006) meeting | - |
| dc.citation.conferencePlace | Hotel Shilla, Jeju | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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