Cited 0 time in
Direct Patterning of Aluminum Thin Films on TiO2-Coated Si Substrates by Using Metal Transfer Printing
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 성명모 | - |
| dc.date.accessioned | 2021-08-04T03:23:20Z | - |
| dc.date.available | 2021-08-04T03:23:20Z | - |
| dc.date.issued | 2006-04-21 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/70421 | - |
| dc.description.abstract | We report a new method for contact printing of Al patterns on Si substrates with a TiO2 layer. Metal transfer printing relies on the transfer of a metallic ink from the structured surface of a poly(dimethylsiloxane) (PDMS) stamp to a substrate. The Al thin films were deposited on a PDMS stamp coated with the self-assembled monolayers (SAMs) of octadecyltrichlorosilane(OTS).The OTS-SAMs can act as a release layer to help the transfer of the Al ink from the stamp. Contacting this stamp to the Si substrate coated with a TiO2 layer, which can act as an adhesion layer to promote the adhesive bonding if the Al metal. The patterned Al thin films have been characterized by atomic force microscopy(AFM), scanning electron microscopy(SEM), Optical microscopy. | - |
| dc.title | Direct Patterning of Aluminum Thin Films on TiO2-Coated Si Substrates by Using Metal Transfer Printing | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제 97회 대한화학회 | - |
| dc.citation.conferencePlace | KINTEX | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
