Electrical Characterization of SAMs/TiO2 Hybrid Thin Films Formed by Molecular Layer Deposition

Abstract

SAMs/TiO2 hybrid thin films were fabricated by a new growth technique that can control thickness with nanometer level. This method is based on the molecular layer deposition of self-assembled monolayers (SAMs) in gas phase and atomic layer deposition of TiO2. The SAMs/TiO2 hybrid thin films exhibit a good thermal and mechanical stability, and a reversible hysteretic behavior which will be a potential material for nonvolatile memory application. The hybrid thin films have been investigated by transmission electron microscopy (TEM), x-ray photoelectron spectroscopy (XPS), water contact angles analysis, and digital multimeter.