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단일벽 탄소나노튜브 박막 트랜지스터에 대한 전기화학적 게이팅 특성조사

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dc.contributor.author이승백-
dc.date.accessioned2021-08-04T03:35:40Z-
dc.date.available2021-08-04T03:35:40Z-
dc.date.issued2006-02-24-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/70724-
dc.description.abstractWe have investigated the electrochemical gating characteristics of hole transport in aligned single-walled carbon nanotube (SWCNT) network thin film transistors(TFT). SWCNT thin films were aligned between source and drain electrodes using dielectrophoresis. Electric field applied between the 1 mM NaCl solution and the SWCNT actively controlled the hole transport in the p-type TFT. This may be due to the applied electric field polarizing the ions creating an electrical double layer on the SWCNT surface, which actively raises or lowers the p-type thin film`s Fermi level. Compared to the transfer characteristics obtained using the substrate as a backgate, electrochemical gating shows much enhanced capacitive coupling between the gate and the SWCNT and much increased transconductance characteristics.-
dc.title단일벽 탄소나노튜브 박막 트랜지스터에 대한 전기화학적 게이팅 특성조사-
dc.typeConference-
dc.citation.conferenceName제13회 한국반도체학술대회-
dc.citation.conferencePlace제주도, 라마다프라자제주호텔-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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