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The Effects of Water-Soluble Oragnic Additives on the Rhelogical Behavior of Colloidal Silica Slurry and Its Influence on Wafer Polishing Process

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dc.contributor.author박재근-
dc.date.accessioned2021-08-04T05:54:28Z-
dc.date.available2021-08-04T05:54:28Z-
dc.date.issued2004-06-04-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/74494-
dc.titleThe Effects of Water-Soluble Oragnic Additives on the Rhelogical Behavior of Colloidal Silica Slurry and Its Influence on Wafer Polishing Process-
dc.typeConference-
dc.citation.conferenceNameInternational Conference on Crystal Growth And LED Epi and Substrate-
dc.citation.conferencePlaceSungkyunkwan University, Suwon, Korea-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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