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Low Temperature growth of Silicon Oxide by Remote Plasma Atomic Layer Deposition using Bis(diethylamino)silane and O2 plasma
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-07-30T08:31:16Z | - |
| dc.date.available | 2021-07-30T08:31:16Z | - |
| dc.date.issued | 20201016 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/7476 | - |
| dc.title | Low Temperature growth of Silicon Oxide by Remote Plasma Atomic Layer Deposition using Bis(diethylamino)silane and O2 plasma | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2020년 온라인 추계학술대회 | - |
| dc.citation.conferencePlace | 명지대 자연캠퍼스 창조예술관 5층 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)