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Design of Oxygen Precipitate Formation in 300mm Silicon Wafer Using NH3/Ar Rapid Thermal Annealing
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박재근 | - |
| dc.date.accessioned | 2021-08-04T06:24:02Z | - |
| dc.date.available | 2021-08-04T06:24:02Z | - |
| dc.date.issued | 2004-02-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/75288 | - |
| dc.title | Design of Oxygen Precipitate Formation in 300mm Silicon Wafer Using NH3/Ar Rapid Thermal Annealing | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국 반도체 학술 대회 | - |
| dc.citation.conferencePlace | 무주리조트 호텔티롤 | - |
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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