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PEALD법으로 증착된 ZrO2 Gate Dielectric의 열처리 온도에 따른 특성의 변화

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-04T08:21:06Z-
dc.date.available2021-08-04T08:21:06Z-
dc.date.issued2002-05-17-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/78204-
dc.titlePEALD법으로 증착된 ZrO2 Gate Dielectric의 열처리 온도에 따른 특성의 변화-
dc.typeConference-
dc.citation.conferenceName2002 한국재료학회 춘계학술발표대회-
dc.citation.conferencePlace한양대학교(안산) 제1과학기술관 및 백남학술관-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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