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Characteristics of TiAlN and TiN/Al Multilayer Thin Films Deposited by Metal Organic Atomic Layer Deposition (MOALD) Method
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김영도 | - |
| dc.date.accessioned | 2021-08-04T08:49:06Z | - |
| dc.date.available | 2021-08-04T08:49:06Z | - |
| dc.date.issued | 20010719 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/79325 | - |
| dc.title | Characteristics of TiAlN and TiN/Al Multilayer Thin Films Deposited by Metal Organic Atomic Layer Deposition (MOALD) Method | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The Fourth joint Symposium on Electronic Materials | - |
| dc.citation.conferencePlace | Paros Hotel, Yangpyung | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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- Kim, Young Do
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)