Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effects of Pattern Density on CMP removal rate and Uniformity
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 백운규 | - |
| dc.date.accessioned | 2021-08-04T09:23:50Z | - |
| dc.date.available | 2021-08-04T09:23:50Z | - |
| dc.date.issued | 2000-11-02 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/80006 | - |
| dc.title | Effects of Pattern Density on CMP removal rate and Uniformity | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 10th Seoul International Symposium on the Physics of Semiconductors and Applications - 2000 | - |
| dc.citation.conferencePlace | 제주도 그랜드 호텔 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)