Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
The Removal of Native and Chemical Oxides on Si(100)Surface by In-situ Heat Treatment in Ultra High Vacuum
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-04T09:24:12Z | - |
| dc.date.available | 2021-08-04T09:24:12Z | - |
| dc.date.issued | 2000-11-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/80031 | - |
| dc.title | The Removal of Native and Chemical Oxides on Si(100)Surface by In-situ Heat Treatment in Ultra High Vacuum | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | ISPSA-2000 | - |
| dc.citation.conferencePlace | 제주 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.