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The Water-based Photoresist for Negative-Tone Images
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김종만 | - |
| dc.date.accessioned | 2021-08-04T09:34:03Z | - |
| dc.date.available | 2021-08-04T09:34:03Z | - |
| dc.date.issued | 2000-10-13 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/80190 | - |
| dc.description.abstract | A terpolymer was prepared for a negative-tone resist material. The terpolymer P(AA/n-BA/t-BA) was synthesized by conventional emulsion polymerization. Thin films of the polymer were prepared on a silicon wafer by spin-casting the polymer emulsion containing a water-soluble photoacid generator. Irradiation of the film with 250 nm UV followed by post exposure baking and development in diluted aqueous base allowed generation of relief images at 30 μm resolution. | - |
| dc.title | The Water-based Photoresist for Negative-Tone Images | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국고분자학회 추계 학술대회 | - |
| dc.citation.conferencePlace | 충남대학교 | - |
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Collections - 서울 공과대학 > 서울 화학공학과 > 2. Conference Papers
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Related Researcher
- Kim, Jong Man
- COLLEGE OF ENGINEERING (DEPARTMENT OF CHEMICAL ENGINEERING)