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A study on the characteristics of TiN thin film deposited by atomic layer chemical vapor deposition method
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-04T09:54:37Z | - |
| dc.date.available | 2021-08-04T09:54:37Z | - |
| dc.date.issued | 1999-10-25 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/81010 | - |
| dc.title | A study on the characteristics of TiN thin film deposited by atomic layer chemical vapor deposition method | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | AMERICAN VACUUM SOCIETY | - |
| dc.citation.conferencePlace | SEATTLE | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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