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Si(100)기판의 표면 구조변화에 따른 화학적 산화막을 이용한 CoSi2의 성장에 관한 연구

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-04T10:23:01Z-
dc.date.available2021-08-04T10:23:01Z-
dc.date.issued19990501-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/81454-
dc.titleSi(100)기판의 표면 구조변화에 따른 화학적 산화막을 이용한 CoSi2의 성장에 관한 연구-
dc.typeConference-
dc.citation.conferenceName한국 재료학회 춘계 학술대회-
dc.citation.conferencePlace금오공대-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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