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TiN diffusion barrier formation by pulsed source chemical vapor deposition method

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dc.contributor.author전형탁-
dc.date.accessioned2021-08-04T10:53:04Z-
dc.date.available2021-08-04T10:53:04Z-
dc.date.issued19980401-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/82441-
dc.titleTiN diffusion barrier formation by pulsed source chemical vapor deposition method-
dc.typeConference-
dc.citation.conferenceNameMRS Symposium-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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