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The Properties of Thin Gate OxidesDepending on the Different Sets of SiWafer Cleaning
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전형탁 | - |
| dc.date.accessioned | 2021-08-04T12:21:42Z | - |
| dc.date.available | 2021-08-04T12:21:42Z | - |
| dc.date.issued | 1994-03-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/84356 | - |
| dc.title | The Properties of Thin Gate OxidesDepending on the Different Sets of SiWafer Cleaning | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | Workshop on Semi. Wafer Clean.and Surf. Char. proc. | - |
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