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A Study on the Etching Process Conditions for Improving Vertical Profile of 3-D NAND Flash Channel Hole
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 송윤흡 | - |
| dc.date.accessioned | 2021-08-02T08:31:23Z | - |
| dc.date.available | 2021-08-02T08:31:23Z | - |
| dc.date.issued | 2020-08-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/8536 | - |
| dc.title | A Study on the Etching Process Conditions for Improving Vertical Profile of 3-D NAND Flash Channel Hole | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 대한전자공학회 하계학술대회 | - |
| dc.citation.conferencePlace | 제주롯데호텔 | - |
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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Related Researcher
- Song, Yun Heub
- COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)