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Showing results 1 to 2 of 2
A study on the defects in the fabrication of CMOS retrograded well including a buried layer using MeV ion implantation
Jang, YT; Yoo, SH; Ro, JS
Article
Issue Date
1998
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.33, pp.S239 - S242
Publisher
KOREAN PHYSICAL SOC
Activation and deactivation in heavily boron-doped silicon
Yoo, SH; Ro, JS
Article
Issue Date
2003
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.43, no.2, pp.290 - 295
Publisher
KOREAN PHYSICAL SOC
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