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Processing of interferometric MEMS-type reflective display using photoresist as sacrificial layer
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, H.-C. | - |
| dc.contributor.author | Kim, Y.-S. | - |
| dc.date.accessioned | 2021-12-17T04:42:19Z | - |
| dc.date.available | 2021-12-17T04:42:19Z | - |
| dc.date.created | 2021-12-16 | - |
| dc.date.issued | 2010 | - |
| dc.identifier.issn | 0000-0000 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/21659 | - |
| dc.description.abstract | In this study, an attempt was made to utilize photoresist as a sacrificial layer in the processing of interferometric type. MEMS reflective displays. The results indicated that the photoresist became dissolved in etching solution more cleanly, making the process more productive and economic. © 2010 ITE and SID. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.title | Processing of interferometric MEMS-type reflective display using photoresist as sacrificial layer | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Kim, Y.-S. | - |
| dc.identifier.scopusid | 2-s2.0-79956305461 | - |
| dc.identifier.bibliographicCitation | IDW'10 - Proceedings of the 17th International Display Workshops, v.2, pp.1631 - 1632 | - |
| dc.relation.isPartOf | IDW'10 - Proceedings of the 17th International Display Workshops | - |
| dc.citation.title | IDW'10 - Proceedings of the 17th International Display Workshops | - |
| dc.citation.volume | 2 | - |
| dc.citation.startPage | 1631 | - |
| dc.citation.endPage | 1632 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Conference Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalRegisteredClass | scopus | - |
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