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63.3: Back-exposure manufacturing route for MEMS reflective display
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, H.-C. | - |
| dc.contributor.author | Oh, J.-H. | - |
| dc.contributor.author | Choi, H.-N. | - |
| dc.contributor.author | Kim, Y.-S. | - |
| dc.date.accessioned | 2021-12-17T04:42:34Z | - |
| dc.date.available | 2021-12-17T04:42:34Z | - |
| dc.date.created | 2021-12-16 | - |
| dc.date.issued | 2010 | - |
| dc.identifier.issn | 0000-0000 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/21674 | - |
| dc.description.abstract | In this study, we attempted a new manufacturing route for an interferometric modulator type MEMS display. Instead of conventional pattern forming process, we developed back-exposure procedure combined with lift-off process to reduce the number of masks and alignment steps used. The pixel structure manufactured revealed that this new procedure is capable of producing the device with high accuracy and quality. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.title | 63.3: Back-exposure manufacturing route for MEMS reflective display | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Kim, Y.-S. | - |
| dc.identifier.scopusid | 2-s2.0-80755130207 | - |
| dc.identifier.bibliographicCitation | 48th Annual SID Symposium, Seminar, and Exhibition 2010, Display Week 2010, v.2, pp.943 - 945 | - |
| dc.relation.isPartOf | 48th Annual SID Symposium, Seminar, and Exhibition 2010, Display Week 2010 | - |
| dc.citation.title | 48th Annual SID Symposium, Seminar, and Exhibition 2010, Display Week 2010 | - |
| dc.citation.volume | 2 | - |
| dc.citation.startPage | 943 | - |
| dc.citation.endPage | 945 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Conference Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalRegisteredClass | scopus | - |
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