Effects of SAMs treatment by ALD on the performance of organic thin film transistors
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, H. | - |
dc.contributor.author | Park, J. | - |
dc.contributor.author | Bong, K.-W. | - |
dc.contributor.author | Kang, J.-M. | - |
dc.contributor.author | Kim, H.-M. | - |
dc.contributor.author | Choi, J.-S. | - |
dc.date.accessioned | 2022-02-07T07:43:18Z | - |
dc.date.available | 2022-02-07T07:43:18Z | - |
dc.date.created | 2022-02-07 | - |
dc.date.issued | 2006 | - |
dc.identifier.issn | 1083-1312 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/25086 | - |
dc.description.abstract | The characteristics of OTFTs have been improved by using SAMs that were formed by atomic layer deposition which is an ultra-thin film deposition technique. SAMs make pentacene be deposited in the upright order on the gate insulator. The operational characteristic improvements of the OTFTs with the SAM will be discussed. © 2006 SID. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.title | Effects of SAMs treatment by ALD on the performance of organic thin film transistors | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Choi, J.-S. | - |
dc.identifier.scopusid | 2-s2.0-34748851949 | - |
dc.identifier.bibliographicCitation | SID Conference Record of the International Display Research Conference, pp.326 - 328 | - |
dc.relation.isPartOf | SID Conference Record of the International Display Research Conference | - |
dc.citation.title | SID Conference Record of the International Display Research Conference | - |
dc.citation.startPage | 326 | - |
dc.citation.endPage | 328 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | ALD | - |
dc.subject.keywordAuthor | OTFTs | - |
dc.subject.keywordAuthor | Pentacene | - |
dc.subject.keywordAuthor | PVP | - |
dc.subject.keywordAuthor | SAMs | - |
dc.subject.keywordAuthor | Surface treatment | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
94, Wausan-ro, Mapo-gu, Seoul, 04066, Korea02-320-1314
COPYRIGHT 2020 HONGIK UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.