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펨토초급 극초단 펄스레이저에 의해 가열된 실리콘 내의 열전달 특성에 관한 수치해석Numerical Analysis on Heat Transfer Characteristics in Silicon Heated by Picosecond-to-Femtosecond Ultra-Short Pulse Laser

Other Titles
Numerical Analysis on Heat Transfer Characteristics in Silicon Heated by Picosecond-to-Femtosecond Ultra-Short Pulse Laser
Authors
이성혁이준식최영기박승호
Issue Date
2002
Publisher
대한기계학회
Citation
대한기계학회논문집 B, v.26, no.10, pp.12 - 1435
Journal Title
대한기계학회논문집 B
Volume
26
Number
10
Start Page
12
End Page
1435
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/26949
ISSN
1226-4881
Abstract
The main aim of the present article is numerically to investigate the micro-scale heat transfer phenomena in a silicon microstructure irradiated by picosecond-to-femtosecond ultra-short laser pulses. Carrier-lattice non-equilibrium phenomena are simulated with a self-consistent numerical model based on Boltzmann transport theory to obtain the spatial and temporal evolutions of the lattice temperature, the carrier number density and its temperature. Especially, an equilibration time, after which carrier and lattice are in equilibrium, is newly introduced to quantify the time duration of non-equilibrium state. Significant increase in carrier temperature is observed for a few picosecond pulse laser, while the lattice temperature rise is relatively small with decreasing laser pulse width. It is also found that the laser flue nee significantly affects the N3 decaying rate of Auger recombination, the carrier temperature exhibits two peaks as a function of time due to Auger heating as well as direct laser heating of the carriers, and finally both laser fluence and pulse width play an important role in controlling the duration time of non-equilibrium between carrier and lattice.
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