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Fabrication of thin film inductors using FeTaN soft magnetic films

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dc.contributor.authorLee, CH-
dc.contributor.authorShin, DH-
dc.contributor.authorAhn, DH-
dc.contributor.authorNam, SE-
dc.contributor.authorKim, HJ-
dc.date.accessioned2022-05-18T06:41:09Z-
dc.date.available2022-05-18T06:41:09Z-
dc.date.created2022-05-18-
dc.date.issued1999-04-15-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/27602-
dc.description.abstractPlanar-type thin film inductors were fabricated using FeTaN soft magnetic films. It was found that excellent soft magnetic properties (coercivity of 0.1-0.2 Oe, effective permeability of 4000, and saturation magnetization of 15 kG) could be obtained in the Fe78.8Ta8.5N12.7 films after anneals at 400-500 degrees C. The initial permeability of the films was constant up to 20 MHz. Internal-coil inductors, in which Cu coils were sandwiched by SiO2 insulator/FeTaN magnetic layers, were fabricated and their characteristics were compared with air-core inductors. The inductance was increased by a factor of 4 compared to air-core inductors. However, the high frequency characteristic was degraded due to a frequency-limited permeability of FeTaN magnetic layers. (C) 1999 American Institute of Physics. [S0021-8979(99)61508-0].-
dc.language영어-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.titleFabrication of thin film inductors using FeTaN soft magnetic films-
dc.typeArticle-
dc.contributor.affiliatedAuthorNam, SE-
dc.contributor.affiliatedAuthorKim, HJ-
dc.identifier.doi10.1063/1.369135-
dc.identifier.wosid000079850700207-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.85, no.8, pp.4898 - 4900-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume85-
dc.citation.number8-
dc.citation.startPage4898-
dc.citation.endPage4900-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
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