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Thermoelectric Thin Film Devices for Energy Harvesting with the Heat Dissipated from High-Power Light-Emitting Diodes

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dc.contributor.authorKim, Jae-Hwan-
dc.contributor.authorKim, Woo-Jun-
dc.contributor.authorOh, Tae-Sung-
dc.date.available2020-07-10T06:01:39Z-
dc.date.created2020-07-06-
dc.date.issued2016-07-
dc.identifier.issn0361-5235-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/7646-
dc.description.abstractWe examined the power-generation characteristics of thin-film devices using the heat dissipated from high-power light-emitting diodes. The thin-film device was fabricated around an light-emitting diode (LED) chip by electrodepositing four pairs of the 10 mu m-thick Bi2Te3 and Sb2Te3 films using either the high resistive Ti seed layer or the more conductive Ti/Cu/Au seed layer. The seed layer effect was more profound for the output power of the thin-film device than its output voltage. The open circuit voltages of 0.61 mV at Delta T for 4.1 K and 0.52 mV at Delta T for 4.9 K were obtained for the thin-film devices fabricated on the highly resistive Ti seed layer and the more conductive Ti/Cu/Au seed layer, respectively. Compared to 0.64 nW at Delta T for 4.1 K for the device processed on the more resistive Ti seed layer, a large maximum output power of 33.6 nW was obtained at Delta T of 4.9 K for the device built on the less resistive Ti/Cu/Au seed layer.-
dc.language영어-
dc.language.isoen-
dc.publisherSPRINGER-
dc.subjectANTIMONY-TELLURIDE-
dc.subjectBI2TE3 FILMS-
dc.subjectELECTRODEPOSITION-
dc.subjectOPTIMIZATION-
dc.subjectFABRICATION-
dc.titleThermoelectric Thin Film Devices for Energy Harvesting with the Heat Dissipated from High-Power Light-Emitting Diodes-
dc.typeArticle-
dc.contributor.affiliatedAuthorOh, Tae-Sung-
dc.identifier.doi10.1007/s11664-016-4485-6-
dc.identifier.scopusid2-s2.0-84964078879-
dc.identifier.wosid000377434100022-
dc.identifier.bibliographicCitationJOURNAL OF ELECTRONIC MATERIALS, v.45, no.7, pp.3410 - 3417-
dc.relation.isPartOfJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.titleJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.volume45-
dc.citation.number7-
dc.citation.startPage3410-
dc.citation.endPage3417-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusANTIMONY-TELLURIDE-
dc.subject.keywordPlusBI2TE3 FILMS-
dc.subject.keywordPlusELECTRODEPOSITION-
dc.subject.keywordPlusOPTIMIZATION-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordAuthorThermoelectric device-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthorbismuth telluride-
dc.subject.keywordAuthorantimony telluride-
dc.subject.keywordAuthorseed layer-
dc.subject.keywordAuthorelectrodeposition-
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