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AlGaN/GaN MetalOxideSemiconductor Heterojunction Field-Effect Transistor Integrated With Clamp Circuit to Enable Normally-Off Operation

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dc.contributor.authorHan, Sang-Woo-
dc.contributor.authorPark, Sung-Hoon-
dc.contributor.authorLee, Jae-Gil-
dc.contributor.authorLim, Jongtae-
dc.contributor.authorCha, Ho-Young-
dc.date.available2020-07-10T07:05:48Z-
dc.date.created2020-07-06-
dc.date.issued2015-06-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/9820-
dc.description.abstractWe have developed an AlGaN/GaN-on-Si metal-oxide-semiconductor heterojunction field-effect transistor (MOSHFET) integrated with a clamp circuit to enable normally-off operation. A clamp circuit consisting of a multilayer MIM capacitor and a Schottky barrier diode was monolithically integrated with a normally ON AlGaN/GaN MOSHFET. The integrated clamp circuit shifted the input driving signal from (0, 20 V) to (-19.2, 0.8 V), allowing the normally ON AlGaN/GaN MOSHFET with a pinchoff voltage of -14 V to be operated as a normally-off device. The multichannel device with a 5-mm channel width exhibited a drain current density of similar to 470 mA/mm and a breakdown voltage of >900 V. In comparison with other conventional normally-off GaN-based FETs, a higher threshold voltage with high current density (i.e., low ON-resistance) can be achieved with easy device processing, no need for gate recess or complicated epitaxial growth.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectGAN HEMT-
dc.titleAlGaN/GaN MetalOxideSemiconductor Heterojunction Field-Effect Transistor Integrated With Clamp Circuit to Enable Normally-Off Operation-
dc.typeArticle-
dc.contributor.affiliatedAuthorLim, Jongtae-
dc.contributor.affiliatedAuthorCha, Ho-Young-
dc.identifier.doi10.1109/LED.2015.2427202-
dc.identifier.scopusid2-s2.0-84930505018-
dc.identifier.wosid000355252300004-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.36, no.6, pp.540 - 542-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume36-
dc.citation.number6-
dc.citation.startPage540-
dc.citation.endPage542-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusGAN HEMT-
dc.subject.keywordAuthorClamp circuit-
dc.subject.keywordAuthorGaN-
dc.subject.keywordAuthormonolithic integration-
dc.subject.keywordAuthormetal-oxide-semiconductor heterojunction field-effect transistor (MOSHFET)-
dc.subject.keywordAuthornormally-off-
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