실리콘 웨이퍼 연마장비용 왁스 스핀코팅장치의 내부기류 제어에 관한 전산유동해석

Abstract

In this paper, the air flow induced by the rotating flat disk is numerically investigated in a hope to better understand the air flow structures inside the wax spin coater for a silicon wafer polishing station. Due to the complex inner geometry of actual spin coater such as the casing around the rotating ceramic block and servo motor, recirculation of air flow is inevitably found on the coating target if the internal space of spin coater is closed at the bottom and it could be the possible source of contamination on the wax coating. By numerical flow simulation, we found that it is necessary to install the air vent at the bottom and to apply the sufficient air suction in order to control the path of air flow and to eliminate the air recirculation zone above the spinning surface of coating target.