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Characteristics of Al doped ZnO co-sputtered InZnO anode films prepared by direct current magnetron sputtering for organic light-emitting diodes

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dc.contributor.authorBae, Jung-Hyeok-
dc.contributor.authorKim, Han-Ki-
dc.date.accessioned2024-02-27T15:02:46Z-
dc.date.available2024-02-27T15:02:46Z-
dc.date.issued2008-09-01-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholarworks.bwise.kr/kumoh/handle/2020.sw.kumoh/27272-
dc.description.abstractWe studied the characteristics of aluminum zinc oxide (AZO) co-sputtered indium zinc oxide (IZO) anode films prepared by dual target direct current (DC) magnetron sputtering at room temperature in a pure Ar ambient environment. It was shown that the AZO co-sputtered IZO anode films exhibited comparable resistivity to pure IZO anode films eventhough AZO co-sputtered IZO has lower indium content. In addition, ultraviolet and visible spectrometer examination results showed that AZO co-sputtered IZO anodes have high transparency comparable to pure IZO anodes. Furthermore, AZO co-sputtered IZO shows a very smooth and featureless surface due to low substrate temperature during the cosputtering process. Using X-ray photoelectron spectroscopy depth profile examination, it was observed that the increase in DC power of the AZO target resulted in a significant decrease of the relative indium, element in the AZO co-sputtered IZO anode films. The current density-voltage-luminance (J-V-L) of the organic light light-emitting diodes (OLEDs) fabricated on an AZO co-sputtered IZO anode was similar to that of the OLED fabricated on a pure IZO anode. In addition, it was found that the J-V-L characteristics of the OLED were critically dependent on the sheet resistance of the AZO co-sputtered IZO anode. (c) 2008 Elsevier B.V. All rights reserved.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE SA-
dc.titleCharacteristics of Al doped ZnO co-sputtered InZnO anode films prepared by direct current magnetron sputtering for organic light-emitting diodes-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.1016/j.tsf.2008.05.035-
dc.identifier.wosid000259727900099-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.516, no.21, pp 7866 - 7870-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume516-
dc.citation.number21-
dc.citation.startPage7866-
dc.citation.endPage7870-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusOXIDE THIN-FILMS-
dc.subject.keywordPlusTRANSPARENT-
dc.subject.keywordPlusALTERNATIVES-
dc.subject.keywordAuthorAZO-
dc.subject.keywordAuthorco-sputtered IZO-
dc.subject.keywordAuthoranode-
dc.subject.keywordAuthorresistivity-
dc.subject.keywordAuthortransparency-
dc.subject.keywordAuthororganic light emitting diodes (OLEDs)-
dc.subject.keywordAuthormagnetron sputtering-
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