Glass Transition Temperature and Isothermal Physical Aging of PMMA Thin Films Incorporated with POSS
- Authors
- Jin, Silo; Lee, Jong Keun
- Issue Date
- Jul-2012
- Publisher
- POLYMER SOC KOREA
- Keywords
- PMMA; thin film; POSS; glass transition temperature; isothermal physical aging
- Citation
- POLYMER-KOREA, v.36, no.4, pp 507 - 512
- Pages
- 6
- Journal Title
- POLYMER-KOREA
- Volume
- 36
- Number
- 4
- Start Page
- 507
- End Page
- 512
- URI
- https://scholarworks.bwise.kr/kumoh/handle/2020.sw.kumoh/28143
- DOI
- 10.7317/pk.2012.36.4.507
- ISSN
- 0379-153X
2234-8077
- Abstract
- Thin (similar to 650 nm) and ultrathin (similar to 50 nm) films of neat PMMA and PMMA containing 5 wt% of methacryl-polyhedral oligomeric silsesquioxane were prepared in this work. The effects of film thickness and PUSS on glass transition temperature (T-g) and isothermal physical aging were investigated by means of differential scanning calorimetry (DSC). T-g depression was observed as film thickness was decreased and Ma-POSS molecules were incorporated. Enthalpy relaxation (Delta H-Relax) due to the isothermal physical aging was reduced by ultra-thin film thickness and the addition of Ma-POSS. KWW (Kohlrausch-Williams-Watts) equation was used to fit Delta H-Relax vs. aging time data providing the fitting parameters; maximum enthalpy recovery (Delta H-infinity), relaxation time (tau) and non-exponentiality parameter (beta).
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