레지스트 잔류층 두께와 몰드 유입속도가 기포결함에 미치는 영향에 대한 수치해석
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이우영 | - |
dc.contributor.author | 김남웅 | - |
dc.contributor.author | 김동현 | - |
dc.contributor.author | 김국원 | - |
dc.date.accessioned | 2021-08-11T21:24:38Z | - |
dc.date.available | 2021-08-11T21:24:38Z | - |
dc.date.created | 2021-06-17 | - |
dc.date.issued | 2015 | - |
dc.identifier.issn | 1738-2270 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/sch/handle/2021.sw.sch/11214 | - |
dc.description.abstract | Recently, the major trends of NIL are high throughput and large area patterning. For UV NIL, if it can be proceeded in the non-vacuum environment, which greatly simplifies tool construction and greatly shorten process times. However, one key issue in non-vacuum environment is air bubble formation problem. In this paper, numerical analysis of bubble defect of UV NIL is performed. Fluent, flow analysis focused program was utilized and VOF(Volume of Fluid) skill was applied. For various resist-substrate and resist-mold angles, effects of velocity inlet and residual layer thickness of resist on bubble defect formation were investigated. The numerical analyses show that the increases of velocity inlet and residual layer thickness can cause the bubble defect formation, however the decreases of velocity inlet and residual layer thickness take no difference in the bubble defect formation. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | 한국반도체디스플레이기술학회 | - |
dc.title | 레지스트 잔류층 두께와 몰드 유입속도가 기포결함에 미치는 영향에 대한 수치해석 | - |
dc.title.alternative | Numerical Analysis of Effects of Velocity Inlet and Residual Layer Thickness of Resist on Bubble Defect Formation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | 김국원 | - |
dc.identifier.bibliographicCitation | 반도체디스플레이기술학회지, v.14, no.3, pp.61 - 66 | - |
dc.relation.isPartOf | 반도체디스플레이기술학회지 | - |
dc.citation.title | 반도체디스플레이기술학회지 | - |
dc.citation.volume | 14 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 61 | - |
dc.citation.endPage | 66 | - |
dc.type.rims | ART | - |
dc.identifier.kciid | ART002038522 | - |
dc.description.journalClass | 2 | - |
dc.description.journalRegisteredClass | kci | - |
dc.subject.keywordAuthor | Resist layer thickness | - |
dc.subject.keywordAuthor | Velocity inlet | - |
dc.subject.keywordAuthor | Bubble | - |
dc.subject.keywordAuthor | Nanoimprint Lithography(NIL) | - |
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